Other Publications

Conference proceedings

18. M. Tsumaki, Y. Shimizu, T. Ito, “Plasma-induced processing in microdroplets for nanoparticles synthesis,” Prc. of the 9th International Conference on Reactive Plasmas and 33th Symposium on Plasma Processing (ICRP-9/SPP-33), Hawaii, USA, LW1.00170 (2 pages) (2015).

17. T. Goto, Y. Shimizu, T. Ito, “Oxygen sensitivity of zinc oxide nanoparticles produced via laser-ablated plasma in pressurized liquid,” Prc. of the 9th International Conference on Reactive Plasmas and 33th Symposium on Plasma Processing (ICRP-9/SPP-33), Hawaii, USA, LW1.00169 (2 pages) (2015).

16. H. Takao, M. A. Cappelli, T. Ito, “Particle-in-Cell Simulation for Photon-Enhanced Thermionic Emission Energy Converter with Contact Ionization Rate Enhancement,” Prc. of the 8th International Conference on Reactive Plasmas and 31th Symposium on Plasma Processing (ICRP-8/SPP-31), Fukuoka, Japan, 6P-PM-S04-P02 (2 pages) (2014).

15. M. Koizumi, S.A. Kulinich, T. Kondo, Y. Shimizu, T. Ito, “Effect of Environment Conditions on Nanoparticles Laser-Ablated in High-Density Fluids,” Proc. of the 30^th Symp. Plasma Processing (SPP-30), Hamamatsu, Japan, P2-46 (2 pages) (2013).

14. T. Ito, T. Tamura, M. A. Cappelli, S. Hamaguchi, “The Structure of Silicon-based Ball Lightning,” Proc. of the 27^th Symp. Plasma Processing (SPP-27), Kanagawa, Japan, B4-03 (2 pages) (2010).

13. T. Ito, K. Kobayashi, U. Czarnetzki, S. Hamaguchi, “Electric field measurement in repetitively pulsed nanosecond discharges in a high pressure hydrogen environment,” Proc. 19th Int. Symp. Plasma Chem. (ISPC-19), Bochum, Germany, (2009).

12. S. Muller, T. Ito, K. Kobayashi, D. Luggenh?lscher, U. Czarnetzki, S. Hamaguchi, “Electric field measurements in near-atmospheric pressure nitrogen and air based on a four-wave mixing scheme,” Proc. 19th Int. Symp. Plasma Chem. (ISPC-19), Bochum, Germany, (2009).

11. T. Ito, M. A. Cappelli, “Energetic neutral particle production in the cathode sheath of direct-current discharges,” Proc. 18th Int. Symp. Plasma Chem. (ISPC-18), Kyoto, Japan, CD-ROM (2007).

10. T. Ito, M. A. Cappelli, “Development of a Magnetized Microdischarge Ion Source,” Proc. of the 24^th Symp. Plasma Processing (SPP-24), Osaka, Japan, 229-230 (2007).

9. T. Ito, N. Gascon, W. S. Crawford, M. A. Cappelli, “Further Development of a Micro Hall Thruster,” Proceedings of the 42nd Joint Propulsion Conference, Sacramento, California, July 9-12, (2006).

8. D. B. Scharfe, T. Ito, M. A. Cappelli, “Measurements in Stationary Reference Bi Discharge Cell for Diagnostics of a Bismuth Hall Thruster,” Proceedings of the 42nd Joint Propulsion Conference, Sacramento, California, July 9-12, (2006).

7. T. Ito, N. Gascon, W. S. Crawford, M. A. Cappelli, “Ultra-Low Power Stationary Plasma Thruster,” Proceedings of the 29th International Electric Propulsion Conference, Princeton, NJ, October 31 ? November 4, IEPC-2005-198 (2005).

6. M. Sawada, T. Tomai, T. Ito, H. Fujiwara, and K. Terashima, “Micrometer-scale discharge plasma in high pressure H₂O and Xe up to a supercritical condition,” Proc. 17th Int. Symp. Plasma Chem. (ISPC-17), (2005).

5. T. Ito, H. Fujiwara, K. Terashima, “Discharge under a high-pressure carbon dioxide environment up to a supercritical condition,” Proc. 16th Int. Symp. Plasma Chem. (ISPC-16), Taormina, Italy, CD-ROM (2003).

4. Y. Shimizu, T. Sasaki, T. Ito, K. Terashima, N. Koshizaki, “Fabrication of carbon films via UHF micrometer-scale plasma CVD,” Proc. 16th Int. Symp. Plasma Chem. (ISPC-16), Taormina, Italy, CD-ROM (2003).

3. T. Ito, K. Terashima, “Micrometer-scale d.c. discharge plasma generation under a very high-pressure environment,” A. Bouchoule (Ed.) Proc. 15th Int. Symp. Plasma Chem. (ISPC-15), Orleans, France, 2763-2768 (2001).

2. T. Ito, H. Nishiyama, Y. Shimizu, K. Terashima, “Micrometer-scale very-high-frequency (VHF) plasma generation supported by thermoelectrons,” A. Bouchoule (Ed.) Proc. 15th Int. Symp. Plasma Chem. (ISPC-15), Orleans, France, 1497-1502 (2001).

1. T. Ito, T. Izaki, K. Terashima, “Microscale Plasma Generation using Electrodes Fabricated by Lithography and Its Application to Material Processing,” M. Hrabovsk? (Ed.) Proc. 14th Int. Symp. Plasma Chem. (ISPC-14), Prague, Czech Republic, 967-972 (1999).

Technical notes

5. 寺嶋和夫, 伊藤剛仁, 藤原秀行, 片平研, 河野明廣, 王剣亮, 荒巻光利, 一木隆範, “マイクロプラズマの応用,” プラズマ・核融合学会誌 80, 845-853 (2004).

4. 寺嶋和夫, 伊藤剛仁, 笘居高明, “材料デバイスプロセスへの展開,” OplusE 26, 1342-1346 (2004).

3. 寺嶋和夫, 伊藤剛仁,“ナノプラズマ/マイクロプラズマの微細加工技術への応用,” エレクトロニクス実装学会誌 5, 529-532 (2002).

2. 伊藤剛仁, 寺嶋和夫,“マイクロメートルからナノメートル領域での極微細プラズマ発生技術,” 応用物理学会誌 70, 448-449 (2001).

1. 寺嶋和夫, 伊藤剛仁, “マイクロからナノ領域のプラズマ生成とその材料科学への応用,” プラズマ・核融合学会誌 76, 471-476 (2000).

Patents

出願済：5件、成立：1件

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