Program- Presentation Titles
12th EU-Japan Joint Symposium on Plasma Processing (JSPP-12) and the 15th Asia-Pacific Conference on Plasma Science and Technology (APCPST-15)
Open for 2 hours a day from 07:00 to 09:00 GMT (9:00-11:00 CEST, 16:00-18:00 JST) from 29 March (Mon) to 2 April (Fri), 2021.
Open for 2 hours a day from 07:00 to 09:00 GMT (9:00-11:00 CEST, 16:00-18:00 JST) from 29 March (Mon) to 2 April (Fri), 2021.


Time (GMT) |
Presenter Name | Title | |
---|---|---|---|
Monday, 29 March | |||
07:00-07:05 GMT | Opening | ||
Chair | Zoran Petrovic, Masaharu Shiratani | ||
07:05-07:35 GMT | I-1 | Invited Deborah O’Connell (Dublin City Univ.) |
Atmospheric pressure nitrogen plasmas |
07:35-07:55 GMT | O-1 | Xian Meng (Chinese Academy of Sciences) |
Discharge and Flow Field Characteristics of 100W-Class Arcjet Thruster |
07:55-08:15 GMT | O-2 | Jan Kuhfeld (Ruhr Univ. Bochum) |
Nitrogen Vibrational Dynamics in ns-Pulsed Plasma Jets |
08:15-08:35 GMT | O-3 | Joshua Boothroyd (Univ. of York) |
Application of an atmospheric pressure plasma source in atmospheric chemistry: measurements of atomic chlorine reactivity |
08:35-08:55 GMT | O-4 | Peter Papp (Comenius Univ.) |
Electron Processes on Gas Phase Molecules, Clusters of Organometallic Precursors and Mixed Clusters with Acetic Acid |
Tuesday, 30 March | |||
Chair | Uwe Czarnetzki, Anthony Murphy | ||
07:00-07:30 GMT | I-2 | Invited Lenka Zajickova (Masaryk Univ. CITEC) |
Atmospheric Pressure Plasma Jets for Surface Modifications |
07:30-07:50 GMT | O-5 | Longwei Chen (Chinese Academy of Sciences) |
A tentative design and numerical analysis on an inner surface wave microwave plasma source |
07:50-08:10 GMT | O-6 | Deping Yu (Sichuan Univ.) |
A Jet Monitoring System and Evaluation Model for Atmospheric Inductively Coupled Plasma Deterministic Processing |
08:10-08:30 GMT | O-7 | Lucie Blahova (Brno Univ. of Technology) |
Plasma Polymerization and Cell Behaviour on Non-planar Substrates |
08:30-08:50 GMT | O-8 | Filippo Capelli (Univ. of Bologna) |
Plasma assisted decontamination of food packaging material |
Wednesday, 31 March | |||
Chair | Satoshi Hamaguchi, Geun Young Yeom | ||
07:00-07:30 GMT | I-3 | Invited Paul Moroz (Tokyo Electron America, Inc. ) |
Advancement of Feature Scale Simulations |
07:30-07:50 GMT | O-9 | Shota Nunomura (AIST) |
In-situ detection of electronic defects in a-Si:H/c-Si stack during plasma processing |
07:50-08:10 GMT | O-10 | Glenson R. Panghulan (Univ. of the Philippines) |
Deposition of Ti-Al-Si-N Thin Films using Magnetized Sheet Plasma |
08:10-08:30 GMT | O-11 | Sayma Khanom (Kyushu Univ.) |
Application of Oxygen Plasma for the Removal of Metal Ions from Water |
08:30-09:00 GMT | I-4 | Invited Masanaga Fukasawa (Sony Semiconductor Solutions Corp.) |
Ion-induced damage and its control for atomic-precision etching |
Thursday, 1 April | |||
Chair | Uros Cvelbar, Takayuki Watanabe | ||
07:00-07:30 GMT | I-5 | Invited Romolo Laurita (Univ. of Bologna) |
Development of plasma systems for the containment of SARS COV 2 diffusion through bioaerosol and fomite routes |
07:30-07:50 GMT | O-12 | Yukio Hayakawa (Gifu Univ.) |
H2 production characteristics from NH3 by plate-type plasma reactor |
07:50-08:10 GMT | O-13 | Nevena Puač (Institute of Physics Belgrade) |
Immunogenic death of tumor cells induced by plasma activated medium potentiates dendritic cell-mediated anti-tumor response in vitro |
08:10-08:30 GMT | O-14 | Abdulrahman H. Basher (Osaka Univ.) |
Mechanisms of Thermal Etching of a Magnesium Oxide (MgO) by Hexafluoroacetylacetone |
08:30-08:50 GMT | O-15 | Dezhi Xiao (City Univ. of Hong Kong) |
The effects of plasma-induced etching and doping on MoSe2 catalyst for the improvement of electrochemical activity |
Friday, 2 April | |||
Chair | Stefan Matejcik, Yuan-Hong Song | ||
07:00-07:30 GMT | I-6 | Invited Yuan-Hong Song (Dalian Univ. of Technology) |
A multiscale hybrid simulation in capacitively coupled radio frequency CF4/Ar plasmas |
07:30-07:50 GMT | O-16 | Hitoshi Tamura (Hitachi High-Technologies Corp.) |
Effect of Reactor Wall on Microwave Electromagnetic Field in Electron Cyclotron Resonance Etching Reactor |
07:50-08:10 GMT | O-17 | Akiko Hirata (Sony Semiconductor Solutions Corp.) |
Plasma-enhanced conversion atomic layer etching for stable etched amount per cycle in SiN etching |
08:10-08:30 GMT | O-18 | Chang Ho Kim (Pusan National Univ.) |
Formative principle of nonuniformity in a capacitively coupled plasma with a two-dimensional particle-in-cell simulation |
08:30-08:50 GMT | O-19 | Kai Zhao (Dalian Univ. of Technology) |
Observation of Nonlinear Standing Waves Excited by Plasma-Series-Resonance-Enhanced Harmonics in Capacitive Discharges |
08:50-08:55 GMT | Closing |